Foundations of physical vapor deposition with plasma assistance

نویسندگان

چکیده

Abstract Physical vapor deposition (PVD) refers to the removal of atoms from a solid or liquid by physical means, followed those on nearby surface form thin film coating. Various approaches and techniques are applied release including thermal evaporation, electron beam ion-driven sputtering, laser ablation, cathodic arc-based emission. Some based plasma discharge, while in other cases composing ionized either due film-forming species they intentionally afterward. Here, brief overview various PVD is given, emphasis which dominated magnetron most widely used technique for both metallic compound films. The advantages drawbacks discussed compared.

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Helicon plasma source for ionized physical vapor deposition

A helicon antenna that sits remotely outside the vacuum system is attached to a magnetron sputtering system. This increases the electron temperature, which increases the ionization of the sputter flux for achieving ionized physical vapor deposition (IPVD). There are no shadowing and contamination problems, unlike other IPVD devices with immersed coils, since the helicon antenna is outside the v...

متن کامل

Comparison of Properties of Ti/TiN/TiCN/TiAlN Film Deposited by Cathodic Arc Physical Vapor and Plasma-assisted Chemical Vapor Deposition on Custom 450 Steel Substrates

This study investigated the effects of deposition techniques on the microstructural and tribological properties of Ti/TiN/TiCN/TiAlN multilayer coatings onto a Custom 450 steel substrate. The coatings were produced using cathodic arc physical vapor deposition (CAPVD) and plasma-assisted chemical vapor deposition (PACVD). The microstructural of the coatings was evaluated using (SEM), and phase f...

متن کامل

Enhancement of aluminum oxide physical vapor deposition with a secondary plasma

Reactive sputtering of aluminum oxide in a planar magnetron system is conducted with a mixture of O and Ar reacting with 2 and bombarding an aluminum target. The aluminum target is powered by a pulsed directed current (DC) bias which functions to discharge the accumulated ions on the insulating AlO film surface during the positive duty cycle and suppresses arc formation. x A seven-turn helical ...

متن کامل

Determination of Optical Properties in Germanium Carbon Coatings Deposited by Plasma Enhanced Chemical Vapor Deposition

In this research, Germanium-carbon coatings were deposited on ZnS substrates by plasma enhanced chemical vapor deposition (PECVD) using GeH4 and CH4 precursors. Optical parameters of the Ge1-xCx coating such as refractive index, Absorption coefficient, extinction coefficient and band gap were measured by the Swanepoel method based on the transmittance spectrum. The results showed that the refra...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Plasma Sources Science and Technology

سال: 2022

ISSN: ['1361-6595', '0963-0252']

DOI: https://doi.org/10.1088/1361-6595/ac7f53